Fractional CO2 Laser for Stretch Mark Treatment

WHAT CAUSES STRETCH MARKS?

Stretch marks are a common occurrence and most people are likely to have experienced them at some point in their life. During periods of rapid growth or weight gain, fine lines may begin to form on the body due to the skin being overstretched. This occurs because the regular production of collagen is disrupted, leading to connective tissue not growing as it should. The dermal and epidermal tearing comes about as a result of this, with the skin not being as elastic as it should be.

Apart from puberty, you are also likely to experience stretch marks during pregnancy or if there is a history of stretch marks within your family.

HOW CAN IT BE TREATED?

Using the new technology of Fractional Laser Resurfacing (Lux1540, non-ablative), stretch marks are fairly easy to treat. Laser energy micro beams are used to break down the skin tissue in small areas, triggering the growth of new, healthy skin over the affected area. Essentially, the laser creates mini wounds and allows the body to naturally heal them, producing collagen and epithelium to aid the process. Similar to using deep chemical peels or ablative lasers, this new technology replicates the results without the discomfort or downtime caused by regular methods. As your skin heals naturally, the new layer will appear much more radiant and healthy, with the unsightly stretch marks and fine lines no longer visible on your skin.

HOW OFTEN?

Your doctor will consult you on the optimum number of treatment sessions but depending on your skin and severity of stretch marks, you may require 2-3 treatments spaced 3-6 months apart. After each session, your skin should progressively feel firmer and refreshed which leads to a faster recovery time for subsequent visits. Be sure to use sunscreen to protect your skin from exposure to the sun to reduce the chances of any complications. Furthermore, a healthy skincare routine consisting of selected products should help you to maintain your fresh skin as well.